ICNEAClass
ICNEA 2614—Manufacturing of organic chemical raw materials
Class · Industrial Classification for National Economic Activities (GB/T 4754-2017) (GB/T 4754-2017)
Where 2614 sits
- C Manufacturing industry
- 26 Chemical raw materials and chemical products manufacturing industry
- 261 Manufacturing of basic chemical raw materials
- 2614 Manufacturing of organic chemical raw materials
What 2614 includes
- Including the manufacturing activities of the following organic chemical raw materials:
- Modified ethanol (part): synthetic alcohol, denatured fuel ethanol, other modified ethanol;
- Bioenergy (part): bio-butanol, biogas;
- ACLC: Saturated ACLC, unsaturated ACLC;
- Cycloalkanes: cycloalkanes, cycloalkenes and cycloterpenes, aromatic hydrocarbons;
- Saturated chlorinated derivatives of ACLC hydrocarbons: methylene chloride, dichloromethane, chloroform (chloroform), carbon tetrachloride, chloroethane, dichloroethane, trichloroethane, tetrachloroethane, hexachloroethane, other saturated chlorinated derivatives of ACLC;
- Unsaturated chlorinated derivatives of ACLC hydrocarbons: vinyl chloride, trichloroethylene, tetrachloroethylene, dichloroethylene, chloropropene, trichloropropene, and other unsaturated chlorinated derivatives of ACLC;
- Fluorinated, brominated, or iodized derivatives of acellular hydrocarbons: bromomethane (methyl bromide), bromoethane, bromopropane, iodoethane, trifluorobromomethane, tetrafluoroethylene, 1-chlorobutane, 1-bromobutane, tetrabromobutane, dibromopentane, diiodomethane,Triiodomethane, fluorinated, brominated or iodinated derivatives of other acellular hydrocarbons;
- Halogenated derivatives of acyl hydrocarbons containing different halogens: trichlorofluoromethane, dichlorodifluoromethane, trichlorotetrifluoroethane, dichlorotetrafluoroethane, chlorotrifluoromethane, pentachlorofluoroethane, tetrachlorodifluoroethane, heptachlorofluoropropane, hexachloroDifluoropropane, pentachlorotrifluoropropane, tetrachlorotetrafluoropropane, trichloropentafluoropropane, dichlorohexafluoropropane, dichloroheptafluoropropane, monofluoroethylene, dichloromethane, difluoromethane (freon-22), difluoromethane (freon-142), othersHalogenated derivatives of acyl hydrocarbons containing different halogens;
- Aromatic hydrocarbon halogenated derivatives: benzene chloride, o-dichlorobenzene, p-dichlorobenzene, hexachlorobenzene, p-chlorotoluene, 3,4-dichlorotrifluorotoluene, trichloroacetaldehyde, other aromatic hydrocarbon halogenated derivatives;
- Hydrocarbon sulfonated, nitrified or nitrified derivatives: benzenesulfonic acid, benzenesulfonic chloride, alkylbenzenesulfonic acid, p-aminobenzenesulfonic chloride, toluenesulfonic acid, xylene sulfonic acid, benzenedisulfonic acid, naphthalene sulfonic acid, nitrobenzene, nitrotoluene, dinitrotoluene,Trinitroxylene (TNT), nitrobenzene chloride, Dinitrobenzene chloride, trichloronitromethane (chloropicic acid; nitrochloroform), Mononitromethane, o-nitrotoluene, p-nitrotoluene, o-nitrochlorobenzene, p-nitrochlorobenzene, dinitrochlorobenzene, nitrocellulose, other hydrocarbon sulfonated, nitrified or nitrified derivatives;
- Acyl alcohol and its derivatives: monohydric alcohol, diol, polyol;
- Cyclic alcohol: cycloalkanol, cycloenol, cycloterpenol, aromatic alcohol;
- Phenols: monophenols, polyphenols, phenols;
- Phenols and phenol derivatives: phenols and phenol halogenated derivatives, phenols and phenol sulfonated derivatives, phenols and phenol nitrified or nitrified derivatives;
- Dicarboxylic acid and its derivatives: formic acid and formate, formate, acetic acid and acetate, acetate, chloroacetic acid and its salts and esters, propionic acid and its salts and esters, butyric acid and its salts and esters, valeric acid and its salts and esters, stearate and its salts, palmitic acid and its salts, acrylic acid and itsSalts and esters, methacrylic acid and its salts and esters, oleic acid and its salts and esters, linoleic acid and its salts and esters, linolenic acid and its salts and esters, benzoic acid and its salts and esters, benzoic acid derivatives, phenylacetic acid and its salts and esters, oxalic acid and its salts and esters, adipic acid and its salts and estersEsters, sebacic acid and its salts and esters, Azelaic acid and its salts and esters, phthalates, phthalic anhydrides, terephthalic acid and its salts, lactic acid and its salts and esters, tartaric acid and its salts and esters, grape acid and its salts and esters, phenylglycolic acid and its saltsAnd esters, naphthenic acids and their water-insoluble salts and esters;
- Amino compounds: Acyl monoamines, acyl polyamines, cyclic monoamines or polyamines and their derivatives, cyclic aromatic monoamines, cyclic aromatic polyamines, oxygen-containing amino compounds, nitrile-based compounds, diazo, azo and oxidized azo compounds, hydrazine or its organic derivatives;
- Nitrogen-containing compounds: isocyanate, sodium cyclohexyl aminosulfonate (cyclamate), other nitrogen-containing compounds;
- Ether: Methyl ether, diethyl ether, dichloroethyl ether, diisopropyl ether, dibutyl ether, dipentyl ether, methyl ethyl ether, ethylisopropyl ether, Ethylbutyl ether, ethylpentyl ether, cyclic ether, polyol glycidyl ether, glycerol ether, cycloterpenene ether, anisole, phenylethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl ether, dimethyl etherPhenylether, 1,2-diphenoxyethane (ethylene glycol diphenylether), anisole (p-propyl anisole), dibenzyl ether, nitroaniline ether, nitroaniline ether, 2-tert-butyl-5-methyl-4,6-dinitroaniline, β-butyl-5-methyl-4,6-dinitroaniline, β-butyl-5-methyl-4,6-dinitroaniline, β-butyl-5-methyl-4,6-dinitroaniline, β-Naphthalene methyl ether, β-naphthyl ether, m-cresol methyl ether, butyl m-cresol methyl ether, phenyl toluene ether, xylene ether, benzyl ethyl ether, methyl tert-butyl ether, m-methyldiphenylether, other ethers;
- Ether alcohol: 2,2-oxygen-linked diethanol (diethylene glycol), ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, ethylene glycol monobutyl ether, diethylene glycol, related monoalkylethers, dibutanol, related monoalkylethers, M-phenoxybenzyl alcohol, other ether alcohol and its derivatives;
- Ethersphenols and ethersphenols: ethersphenols, ethersphenols, pyrocatechol monoethyl ether, other ethersphenols and ethersphenols;
- Alcohol peroxide, ether peroxide and ketone peroxide: Ethylperanol (ethyl hydrogen peroxide), diethyl peroxide, ether peroxide, other alcohol peroxide, ether peroxide and ketone peroxide;
- Aldehydes: formaldehyde, acetaldehyde, butyraldehyde, heptaldehyde, propionaldehyde, octaldehyde, decaldehyde, nonaldehyde, undecylaldehyde, dodecylaldehyde, acrolein, 2-butenaldehyde (crotonaldehyde), citral, citronella aldehyde, cyclic citral A, cyclic citral B, perilla aldehyde, Tibetan flowerAldehydes, Benzaldehyde, lily of the valley aldehydes, cinnamic aldehydes, α-pentyl cinnamic aldehydes, 3-p-dryenyl-2-methylpropionaldehyde, phenylacetaldehyde, other aldehydes;
- Aldehydes: Ethanolaldehyde, 3-hydroxybutyraldehyde, hydroxycarbonaldehyde, other aldehydes;
- Aldehyde ethers, aldehydophenols and related oxygen-containing aldehydes: vanillin (3-methoxy-4-hydroxybenzaldehyde), ethyl vanillin (3-ethoxy-4-hydroxybenzaldehyde), salicylaldehyde (o-hydroxybenzaldehyde), 3,4-dihydroxybenzaldehyde (protocatechaldehyde)), anisaldehyde (p-methoxybenzaldehyde), other aldehydes, aldophenols and related oxy aldehydes;
- Cyclohexyl Aldehydes: trimeroxymethylene (trioxane), trimeroxymethylene (secondary acetaldehyde), tetraacetaldehyde, and other cyclohexyl aldehydes;
- Polyoxymethylene: Secondary formaldehyde, other polyoxymethylene;
- Ketones: Acetone, butanone (methylethyl (methyl) ketone), 4-methyl-2-pentanone, leucylated oxygen (isopropylidene acetone), phorone, pseudopilazone, pseudomethylpilazone, biphenylacetone (butanedione), acetylacetone, Acetone-based acetone, cyclohexanone, methylcyclohexanone, vinyl ketone, diethylene ketone (Zhixiangkone), methyl Zhixiangkone, Violet ketone, Methyl Violet ketone, iris ketone, Jasmine ketone, paracetamol, cyclopentanone, menthol,Aromatic ketone, phenylacetone (phenylpropyl-2-acetone), acetophenone, methyl naphthyl ketone, benzylidene acetone, phenylethyl (methyl) ketone, methyl acetophenone, butyl dimethyl acetophenone, Biphenyl (methyl) ketone, benzanthrone, phenylAcetone (phenylpropyl-2-ketone), cyclohexanone peroxide, other ketones;
- Ketools, ketoaldehydes and ketophenols: ketools, ketoaldehydes, ketophenols, other ketools, ketoaldehydes and ketophenols;
- Quinone-based compounds: anthraquinone, p-benzoquinone, 1,4-naphthoquinone, 2-methyl anthraquinone, dihydroacenaphenaphenoquinone, phenanthrene quinone, α-hydroxyanthraquinone, quinone, corazine, 1-amino anthraquinone, copper phthalocyanine (solvent phthalocyanine copper, solid phase phthalocyanine copper), Other quinone-based compounds;
- Inorganic acid esters and their salts: phosphate esters and their salts, thiophosphate esters and their salts, sulfate esters and their salts;
- Phosphite esters: trimethyl phosphite, triethyl phosphite, dimethyl phosphite, diethyl phosphite, and other phosphite esters;
- Nitrite, nitrate;
- Carbonates, percarbonates and their salts: diethyl carbonate, Di Guaiacol carbonate, propylene carbonate, polyphenylene carbonate, diethylene glycol diallyl carbonate, tetraethyl orthocarbonates, dicarbonates peroxides, Bis (4-tert-butyl cyclohexyl) esters, other carbonates, Polycarbonate and its salts;
- Silicate and its salts: ethyl silicate (tetraethoxysilicate or tetraethyl silicate), other silicate esters and their salts;
- Organic-inorganic compounds: organic sulfur compounds, organic mercury compounds, organic silicon compounds, nucleic acids and their salts;
- Other organic chemical raw materials;
- The following product manufacturing activities are included in this category;
- Phenylmethane diisocyanate (MDI);
- Toluene diisocyanate (TDI);
- Hexamethylene diisocyanate (HDI);
- Isophorone diisocyanate (IPDI);
- Diisocyanate trimer;
- Prepromers containing diisocyanate terminal groups;
- Polyether polyol (PPG);
- Polyester polyol;
- Fluorine refrigerant (zero ODP, low GWP. );
- Perfluorone;
- High-purity, low-impurity fine chemicals such as trifluoroacetic acid;
- Dimethyl cyclosiloxane mixture (DMC);
- Octamethylcyclotetrasiloxane (D4);
- Silane;
- Silane coupling agents and crosslinking agents;
- Organic acid products and pharmaceutical intermediates (refers to lactic acid, succinic acid, adipic acid, polyhydroxy fatty acids, succinic acid and various products with specific properties);
- Highly biocompatible glucomannan;
- Chitosan composite materials and products;
- Biochemical raw materials (refer to protein, nucleic acid, polysaccharide, amino acid, nucleotide, sugar, fatty acid, glycerin, terpene, alkaloid and other products);
- Isoprene;
- Propylene glycol;
- Isopropanol;
- 3-hydroxypropionic acid;
- Butanol;
- Isobutanol;
- Butanediol;
- Butanetriol;
- Succinic acid;
- Glyoxylic acid;
- Fumaric acid;
- Long-chain dibasic acid;
- Long-chain fatty acids;
- Malic acid;
- Itaconic acid;
- Citric acid;
- Citrate;
- Isosorbyl alcohol;
- Chiral compound;
- Steroidal compounds.
What 2614 excludes
2614 in other systems
ANZSICAustralia · New Zealand
- 1812 Basic Organic Chemical Manufacturing approximate via ISIC 2011
- 1813 Basic Inorganic Chemical Manufacturing approximate via ISIC 2011
- 1891 Photographic Chemical Product Manufacturing approximate via ISIC 2011
- 1811 Industrial Gas Manufacturing approximate via ISIC 2011
- 1915 Adhesive Manufacturing approximate via ISIC 2029
- 1892 Explosive Manufacturing approximate via ISIC 2011
- 1916 Paint and Coatings Manufacturing approximate via ISIC 2011
- 1899 Other Basic Chemical Product Manufacturing n.e.c. approximate via ISIC 2011
ATECOItaly
- 20.14 Manufacture of other organic basic chemicals approximate via ISIC 2011
- 20.13 Manufacture of other inorganic basic chemicals approximate via ISIC 2011
- 20.11 Manufacture of industrial gases approximate via ISIC 2011
- 20.59 Manufacture of other chemical products n.e.c. approximate via ISIC 2029
- 20.12 Manufacture of dyes and pigments approximate via ISIC 2011
- 20.51 Manufacture of liquid biofuels approximate via ISIC 2011
- 20.14.00 Manufacture of other organic basic chemicals inferred via ISIC 2011
- 20.13.00 Manufacture of other inorganic basic chemicals inferred via ISIC 2029
CNAE BrazilBrazil
- 20.29-1 Manufacture of organic chemical products not elsewhere specified approximate via ISIC 2029
- 20.11-8 Manufacture of chlorine and alkalis approximate via ISIC 2011
- 2029-1/00 Manufacture of organic chemical products not elsewhere specified inferred via ISIC 2029
- 2011-8/00 Manufacture of chlorine and alkalis inferred via ISIC 2011
- 2019-3/99 Manufacture of other inorganic chemical products not specified elsewhere inferred via ISIC 2011
- 2014-2/00 Industrial gas manufacturing inferred via ISIC 2011
- 2099-1/01 Manufacturing of plates, films, papers and other materials and chemicals for photography inferred via ISIC 2029
- 2092-4/03 Manufacturing of safety matches inferred via ISIC 2029
CNAESpain
- 20.14 Manufacture of other basic organic chemical products approximate via ISIC 2011
- 20.13 Manufacture of other basic inorganic chemical products approximate via ISIC 2011
- 20.11 Industrial gas manufacturing approximate via ISIC 2011
- 20.59 Manufacture of other chemical products n.e.c. approximate via ISIC 2029
- 20.12 Manufacture of dyes and pigments approximate via ISIC 2011
- 20.51 Manufacturing of liquid biofuels approximate via ISIC 2011
HSICHong Kong
- 2011 Manufacture of basic chemicals approximate via ISIC 2011
- 2029 Manufacture of other chemical products n.e.c. approximate via ISIC 2029
- 201101 Manufacture of chemicals inferred via ISIC 2011
- 202999 Manufacture of other miscellaneous chemical products n.e.c. inferred via ISIC 2029
- 201102 Manufacture of dyes inferred via ISIC 2011
- 202904 Manufacture of glue inferred via ISIC 2029
- 202905 Manufacture of explosives inferred via ISIC 2029
- 202901 Manufacture of camphor products inferred via ISIC 2029
ISICUnited Nations (global)
- 2011 Manufacture of basic chemicals approximate
- 2029 Manufacture of other chemical products n.e.c. approximate
JSICJapan
- 1639 Other industrial organic chemical products approximate via ISIC 2011
- 1634 Cyclic intermediates, synthetic dyes and organic pigments approximate via ISIC 2011
- 1696 Natural resin and wood chemical products approximate via ISIC 2011
- 1633 Fermentation chemical products approximate via ISIC 2011
- 1629 Other industrial inorganic chemical products approximate via ISIC 2011
- 1631 Basic petrochemicals, including derivatives produced from an integrated process approximate via ISIC 2011
- 1695 Photosensitive materials approximate via ISIC 2029
- 1622 Inorganic pigments approximate via ISIC 2011
KSICSouth Korea
- 20111 Manufacture of basic organic petrochemicals approximate via ISIC 2011
- 20119 Manufacture of other basic organic chemicals approximate via ISIC 2011
- 20112 Manufacture of based on biomass basic chemicals approximate via ISIC 2011
- 20121 Manufacture of hydrogen approximate via ISIC 2011
- 20122 Manufacture of oxygen, nitrogen and other industrial gases approximate via ISIC 2011
- 20129 Manufacture of other basic inorganic chemicals approximate via ISIC 2011
- 20131 Manufacture of metal oxides for inorganic pigments and related products approximate via ISIC 2011
- 20132 Manufacture of dyes, synthetic inorganic pigments, tanning materials and other coloring agents approximate via ISIC 2011
MSICMalaysia
- 20112 Manufacture of basic organic chemicals approximate via ISIC 2011
- 20119 Manufacture of other basic chemicals n.e.c. approximate via ISIC 2011
- 20113 Manufacture of inorganic compounds approximate via ISIC 2011
- 20111 Manufacture of liquefied or compressed inorganic industrial or medical gases approximate via ISIC 2011
- 20299 Manufacture of other chemical products n.e.c. approximate via ISIC 2029
- 20292 Manufacture of writing and drawing ink approximate via ISIC 2029
- 20291 Manufacture of photographic plates, films, sensitized paper and other sensitized unexposed materials approximate via ISIC 2029
- 2011 Manufacture of basic chemicals broader via ISIC 2011
NACEEuropean Union
- 20.14 Manufacture of other organic basic chemicals approximate via ISIC 2011
- 20.13 Manufacture of other inorganic basic chemicals approximate via ISIC 2011
- 20.11 Manufacture of industrial gases approximate via ISIC 2011
- 20.59 Manufacture of other chemical products n.e.c. approximate via ISIC 2029
- 20.12 Manufacture of dyes and pigments approximate via ISIC 2011
- 20.51 Manufacture of liquid biofuels approximate via ISIC 2011
NAFFrance
- 20.14 Manufacture of other organic basic chemicals approximate via ISIC 2011
- 20.13 Manufacture of other inorganic basic chemicals approximate via ISIC 2011
- 20.11 Manufacture of industrial gases approximate via ISIC 2011
- 20.59 Manufacture of other chemical products n. C. A. approximate via ISIC 2029
- 20.12 Manufacture of dyes and pigments approximate via ISIC 2011
- 20.51 Manufacture of liquid biofuels approximate via ISIC 2011
- 20.14Y Manufacture of other organic basic chemicals inferred via ISIC 2029
- 20.13Y Manufacture of other inorganic basic chemicals inferred via ISIC 2011
NAICSUnited States
- 325130 Synthetic Dye and Pigment Manufacturing approximate via ISIC 2011
- 325120 Industrial Gas Manufacturing approximate via ISIC 2011
- 325193 Ethyl Alcohol Manufacturing approximate via ISIC 2011
- 325920 Explosives Manufacturing approximate via ISIC 2029
- 325199 All Other Basic Organic Chemical Manufacturing approximate via ISIC 2011
- 325180 Other Basic Inorganic Chemical Manufacturing approximate via ISIC 2011
- 325194 Cyclic Crude, Intermediate, and Gum and Wood Chemical Manufacturing approximate via ISIC 2011
- 325110 Petrochemical Manufacturing approximate via ISIC 2011
NAICS CanadaCanada
- 325110 Petrochemical manufacturing approximate via ISIC 2011
- 325120 Industrial gas manufacturing approximate via ISIC 2011
- 325130 Synthetic dye and pigment manufacturing approximate via ISIC 2011
- 325520 Adhesive manufacturing approximate via ISIC 2029
- 325920 Explosives manufacturing approximate via ISIC 2029
- 312140 Distilleries approximate via ISIC 2011
- 325190 Other basic organic chemical manufacturing inferred via ISIC 2029
- 325189 All other basic inorganic chemical manufacturing inferred via ISIC 2029
NICIndia
- 201104 Manufacture of organic acids and organic bases approximate via ISIC 2011
- 201199 Manufacture of other basic chemicals n.e.c approximate via ISIC 2011
- 201106 Manufacture of organic compounds other than dyes, pigments and synthetic aromatic products approximate via ISIC 2011
- 202904 Manufacture of photographic plates, films, sensitized paper, and other sensitized unexposed materials, chemical preparations for photographic uses approximate via ISIC 2029
- 201107 Manufacture of distilled water approximate via ISIC 2011
- 201101 Manufacture of liquefied or compressed inorganic industrial or medical gases (elemental gases, liquid or compressed air, refrigerant gases, mixed industrial gases etc.) approximate via ISIC 2011
- 201108 Manufacture of synthetic aromatic products approximate via ISIC 2011
- 201102 Manufacture of inorganic acids(except nitric acid) and inorganic bases (except ammonia) such as alkalis, lyes except gases approximate via ISIC 2011
NOGASwitzerland
- 2014 Manufacture of other organic basic chemicals approximate via ISIC 2011
- 2013 Manufacture of other inorganic basic chemicals approximate via ISIC 2011
- 2011 Manufacture of industrial gases approximate via ISIC 2011
- 2059 Manufacture of other chemical products n.e.c. approximate via ISIC 2029
- 2012 Manufacture of dyes and pigments approximate via ISIC 2011
- 2051 Manufacture of liquid biofuels approximate via ISIC 2011
- 201400 Manufacture of other organic basic chemicals inferred via ISIC 2029
- 201300 Manufacture of other inorganic basic chemicals inferred via ISIC 2029
PKDPoland
- 20.14 Production of other basic organic chemicals approximate via ISIC 2011
- 20.59 Manufacture of other chemical products, not elsewhere classified approximate via ISIC 2029
- 20.13 Production of other basic inorganic chemicals approximate via ISIC 2011
- 20.11 Production of industrial gases approximate via ISIC 2011
- 20.12 Production of dyes and pigments approximate via ISIC 2011
- 20.51 Production of liquid biofuels approximate via ISIC 2011
- 20.14.Z Production of other basic organic chemicals inferred via ISIC 2011
- 20.13.Z Production of other basic inorganic chemicals inferred via ISIC 2011
SCIANMexico
- 325180 Manufacture of other basic inorganic chemicals approximate via ISIC 2011
- 325110 Manufacturing of basic petrochemicals from natural gas and refined petroleum approximate via ISIC 2011
- 325130 Manufacturing of synthetic pigments and dyes approximate via ISIC 2011
- 325120 Industrial gas manufacturing approximate via ISIC 2011
- 325520 Adhesive manufacturing approximate via ISIC 2029
- 325992 Manufacturing of films, plates and photosensitive paper for photography approximate via ISIC 2029
- 325920 Manufacture of explosives approximate via ISIC 2029
- 325190 Manufacture of other basic organic chemicals inferred via ISIC 2011
SICUnited States (legacy)
- 2892 Explosives approximate via ISIC 2029
- 2842 Polishes and Sanitation Goods approximate via ISIC 2011
- 2843 Surface Active Agents approximate via ISIC 2029
- 2874 Phosphatic Fertilizers approximate via ISIC 2011
- 2891 Adhesives and Sealants approximate via ISIC 2029
- 3482 Small Arms Ammunition approximate via ISIC 2029
- 3483 Ammunition, Except For Small Arms, NEC approximate via ISIC 2029
- 2813 Industrial Gases approximate via ISIC 2011
SNISweden
- 20.14 Manufacture of other organic basic chemicals approximate via ISIC 2011
- 20.13 Manufacture of other inorganic basic chemicals approximate via ISIC 2011
- 20.11 Manufacture of industrial gases approximate via ISIC 2011
- 20.59 Manufacture of other chemical products n.e.c. approximate via ISIC 2029
- 20.12 Manufacture of dyes and pigments approximate via ISIC 2011
- 20.51 Manufacture of liquid biofuels approximate via ISIC 2011
- 20.140 Manufacture of other organic basic chemicals inferred via ISIC 2029
- 20.130 Manufacture of other inorganic basic chemicals inferred via ISIC 2011
SSICSingapore
- 20113 Manufacture of basic chemicals (except fertilisers and nitrogen) approximate via ISIC 2011
- 20292 Manufacture of ultrapure electronic chemicals, materials and laminates approximate via ISIC 2029
- 20119 Manufacture of basic chemicals n.e.c. approximate via ISIC 2011
- 20295 Manufacture of photographic film, paper, plate and chemicals approximate via ISIC 2029
- 20293 Manufacture of water treatment, waste treatment and oilfield chemicals approximate via ISIC 2029
- 20114 Manufacture of solvents approximate via ISIC 2011
- 20111 Manufacture of industrial gases and dry ice approximate via ISIC 2011
- 20299 Manufacture of other chemical products n.e.c. approximate via ISIC 2029
UK SICUnited Kingdom
- 20.14 Manufacture of other organic basic chemicals approximate via ISIC 2011
- 20.13 Manufacture of other inorganic basic chemicals approximate via ISIC 2011
- 20.11 Manufacture of industrial gases approximate via ISIC 2011
- 20.59 Manufacture of other chemical products n.e.c. approximate via ISIC 2029
- 20.12 Manufacture of dyes and pigments approximate via ISIC 2011
- 20.51 Manufacture of liquid biofuels approximate via ISIC 2011
- 20.42 Manufacture of perfumes and toilet preparations inferred via ISIC 2029
WZGermany
- 20.14 Manufacture of other organic basic chemicals approximate via ISIC 2011
- 20.13 Manufacture of other inorganic basic chemicals approximate via ISIC 2011
- 20.11 Manufacture of industrial gases approximate via ISIC 2011
- 20.59 Manufacture of other chemical products n.e.c. approximate via ISIC 2029
- 20.12 Manufacture of dyes and pigments approximate via ISIC 2011
- 20.51 Manufacture of liquid biofuels approximate via ISIC 2011
- 20.14.0 Manufacture of other organic basic chemicals inferred via ISIC 2011
- 20.13.0 Manufacture of other inorganic basic chemicals inferred via ISIC 2011
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